High Reflectivity Laser Line Mirrors | |
---|---|
Substrate Material | UV grade fused silica |
Clear Aperture | >85% |
Dimensions Tolerance | +0/-0,15 mm |
Thickness Tolerance | ±0,25 mm |
Parallelism | <30 arcsec |
Protective Chamfers | <0,35 mm at 45° |
Surface Quality | 20-10 S-D |
Surface Flatness | <λ/8@632,8 nm |
LIDT | 4 J/cm2@1064 nm, 10 ns (for 510-535 + 1020-1070 nm mirrors) |
Model | Size | Wavelength | Reflectivity |
---|---|---|---|
6329 | Ø25.4 x 5mm | 254-266 + 340-360 + 515-535 + 1020-1070nm |
>97% |
6330 | Ø25.4 x 5mm | 254-266 + 515-535nm | >99% |
6331 | Ø25.4 x 5mm | 385-415 + 770-830nm | >99.5% |
6332 | Ø25.4 x 5mm | 510-535 + 1020-1070nm | >99.5% |
Model | Size | Wavelength | Reflectivity |
---|---|---|---|
6333 | Ø25.4 x 5mm | 254-266 + 340-360 + 515-535 + 1020-1070nm |
Rs>97% Rp>94% |
6334 | Ø25.4 x 5mm | 254-266 + 515-535nm | Rs>99% Rp>98% |
6335 | Ø25.4 x 5mm | 385-415 + 770-830nm | Rs>99.5% Rp>98.5% |
6336 | Ø25.4 x 5mm | 510-535 + 1020-1070nm | Rs>99.5% Rp>98.5% |